Kazuhiro Karahashi: search on Z-Library

The world's largest scientific articles store. 70,000,000+ articles for free.

Don't use scam websites

1

Hydrogen effects in hydrofluorocarbon plasma etching of silicon nitride: Beam study with CF+, CF[sub 2][sup +], CHF[sub 2][sup +], and CH2F+ ions

Ito, Tomoko, Karahashi, Kazuhiro, Fukasawa, Masanaga, Tatsumi, Tetsuya, Hamaguchi, Satoshi

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2011

Language:

english

File:

PDF, 575 KB

english, 2011

2

Characterization of polymer layer formation during SiO 2 /SiN etching by fluoro/hydrofluorocarbon plasmas

Miyake, Keita, Ito, Tomoko, Isobe, Michiro, Karahashi, Kazuhiro, Fukasawa, Masanaga, Nagahata, Kazunori, Tatsumi, Tetsuya, Hamaguchi, Satoshi

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 190 KB

english, 2014

3

Effects of hydrogen ion irradiation on zinc oxide etching

Li, Hu, Karahashi, Kazuhiro, Friederich, Pascal, Fink, Karin, Fukasawa, Masanaga, Hirata, Akiko, Nagahata, Kazunori, Tatsumi, Tetsuya, Wenzel, Wolfgang, Hamaguchi, Satoshi

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2017

Language:

english

File:

PDF, 1.77 MB

english, 2017

4

Progress in nanoscale dry processes for fabrication of high-aspect-ratio features: How can we control critical dimension uniformity at the bottom?

Ishikawa, Kenji, Karahashi, Kazuhiro, Ishijima, Tatsuo, Cho, Sung Il, Elliott, Simon, Hausmann, Dennis, Mocuta, Dan, Wilson, Aaron, Kinoshita, Keizo

Journal:

Japanese Journal of Applied Physics

Year:

2018

Language:

english

File:

PDF, 1.54 MB

english, 2018

5

Enhanced etching of tin-doped indium oxide due to surface modification by hydrogen ion injection

Li, Hu, Karahashi, Kazuhiro, Friederich, Pascal, Fink, Karin, Fukasawa, Masanaga, Hirata, Akiko, Nagahata, Kazunori, Tatsumi, Tetsuya, Wenzel, Wolfgang, Hamaguchi, Satoshi

Journal:

Japanese Journal of Applied Physics

Year:

2018

Language:

english

File:

PDF, 4.49 MB

english, 2018

6

Reaction kinetics of chlorine on Si(111)7 × 7 surfaces

Jiro Matsuo, Feurprier Yannick, Kazuhiro Karahashi

Journal:

Surface Science Letters

Year:

1993

Language:

english

File:

PDF, 73 KB

english, 1993

7

Chlorine molecular beam scattering study on Si(100)2 × 1: desorption products

Kazuhiro Karahashi, Jiro Matsuo, Shinpei Hijiya

Journal:

Applied Surface Science

Year:

1992

Language:

english

File:

PDF, 244 KB

english, 1992

8

A selective inhibitor of p38 MAP kinase, SB202190, induced apoptotic cell death of a lipopolysaccharide-treated macrophage-like cell line, J774.1

Hisae Karahashi, Kazuhiro Nagata, Kumiko Ishii, Fumio Amano

Journal:

Biochimica et Biophysica Acta (BBA) - Molecular Basis of Disease

Year:

2000

Language:

english

File:

PDF, 1.07 MB

english, 2000

9

Reaction kinetics of chlorine on Si(111)7 × 7 surfaces

Jiro Matsuo, Feurprier Yannick, Kazuhiro Karahashi

Journal:

Surface Science

Year:

1993

Language:

english

File:

PDF, 514 KB

english, 1993

10

High Resolution Neutron Powder Diffractometer with a Solid Methane Moderator at Pulsed Spallation Neutron Source

Watanabe, Noboru, Asano, Hajime, Iwasa, Hirokatsu, Satoh, Setsuo, Murata, Hideaki, Karahashi, Kazuhiro, Tomiyoshi, Shoichi, Izumi, Fujio, Inoue, Kazuhiko

Journal:

Japanese Journal of Applied Physics

Year:

1987

File:

PDF, 949 KB

1987

11

Mass-analyzed CF[sub x][sup +] (x=1,2,3) ion beam study on selectivity of SiO[sub 2]-to-SiN etching and a-C:F film deposition

Yanai, Ken-ichi, Karahashi, Kazuhiro, Ishikawa, Kenji, Nakamura, Moritaka

Journal:

Journal of Applied Physics

Year:

2005

Language:

english

File:

PDF, 735 KB

english, 2005

12

Etching yield of SiO[sub 2] irradiated by F[sup +], CF[sub x][sup +] (x=1,2,3) ion with energies from 250 to 2000 eV

Karahashi, Kazuhiro, Yanai, Ken-ichi, Ishikawa, Kenji, Tsuboi, Hideo, Kurihara, Kazuaki, Nakamura, Moritaka

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2004

Language:

english

File:

PDF, 497 KB

english, 2004

13

Measurement of desorbed products during organic polymer thin film etching by plasma beam irradiation

Kurihara, Kazuaki, Karahashi, Kazuhiro, Egami, Akihiro, Nakamura, Moritaka

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2006

Language:

english

File:

PDF, 391 KB

english, 2006

14

Transitional change to amorphous fluorinated carbon film deposition under energetic irradiation of mass-analyzed carbon monofluoride ions on silicon dioxide surfaces

Ishikawa, Kenji, Karahashi, Kazuhiro, Tsuboi, Hideo, Yanai, Ken-ichi, Nakamura, Moritaka

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2003

Language:

english

File:

PDF, 324 KB

english, 2003

15

Characteristics of silicon etching by silicon chloride ions

Ito, Tomoko, Karahashi, Kazuhiro, Kang, Song-Yun, Hamaguchi, Satoshi

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2013

Language:

english

File:

PDF, 637 KB

english, 2013

16

Measurements of desorbed products by plasma beam irradiation on SiO[sub 2]

Kurihara, Kazuaki, Yamaoka, Yoshikazu, Karahashi, Kazuhiro, Sekine, Makoto

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2004

Language:

english

File:

PDF, 353 KB

english, 2004

17

Ion beam experiments for the study of plasma–surface interactions

Karahashi, Kazuhiro, Hamaguchi, Satoshi

Journal:

Journal of Physics D Applied Physics

Year:

2014

Language:

english

File:

PDF, 596 KB

english, 2014

18

Si Damage Due to Oblique-Angle Ion Impact Relevant for Vertical Gate Etching Processes

Ito, Tomoko, Karahashi, Kazuhiro, Mizotani, Kohei, Isobe, Michiro, Kang, Song-Yun, Honda, Masanobu, Hamaguchi, Satoshi

Journal:

Japanese Journal of Applied Physics

Year:

2012

Language:

english

File:

PDF, 739 KB

english, 2012

19

Sputtering yields and surface chemical modification of tin-doped indium oxide in hydrocarbon-based plasma etching

Li, Hu, Karahashi, Kazuhiro, Fukasawa, Masanaga, Nagahata, Kazunori, Tatsumi, Tetsuya, Hamaguchi, Satoshi

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2015

Language:

english

File:

PDF, 871 KB

english, 2015

20

Study of the Etching Reaction by Atomic Chlorine Using Molecular Beam Scattering

Karahashi, Kazuhiro, Matsuo, Jiro, Horiuchi, Kei

Journal:

Japanese Journal of Applied Physics

Year:

1994

File:

PDF, 501 KB

1994

21

Mass-selected ion beam study on etching characteristics of ZnO by methane-based plasma

Li, Hu, Karahashi, Kazuhiro, Fukasawa, Masanaga, Nagahata, Kazunori, Tatsumi, Tetsuya, Hamaguchi, Satoshi

Journal:

Japanese Journal of Applied Physics

Year:

2016

Language:

english

File:

PDF, 1.35 MB

english, 2016

22

Evaluation of Si etching yields by Cl + Br + and HBr + ion irradiation

Ito, Tomoko, Karahashi, Kazuhiro, Kang, Song-Yun, Hamaguchi, Satoshi

Journal:

Journal of Physics Conference Series

Year:

2010

Language:

english

File:

PDF, 551 KB

english, 2010

23

Reaction Kinetics of Atomic chlorine on Si(100)2×1

Karahashi, Kazuhiro, Matsuo, Jiro, Horiuchi, Kei

Journal:

MRS Proceedings

Year:

1992

Language:

english

File:

PDF, 520 KB

english, 1992

24

10.1295/koron.41.189

MIZUTANI, Makoto, KARAHASHI, Kazuhiro, SASABE, Hiroyuki

Journal:

KOBUNSHI RONBUNSHU

Year:

1984

File:

PDF, 1.03 MB

1984

25

Progress and prospects in nanoscale dry processes: How can we control atomic layer reactions?

Ishikawa, Kenji, Karahashi, Kazuhiro, Ichiki, Takanori, Chang, Jane P., George, Steven M., Kessels, W. M. M., Lee, Hae June, Tinck, Stefan, Um, Jung Hwan, Kinoshita, Keizo

Journal:

Japanese Journal of Applied Physics

Year:

2017

Language:

english

File:

PDF, 1.35 MB

english, 2017

26

Etching yields and surface reactions of amorphous carbon by fluorocarbon ion irradiation

Karahashi, Kazuhiro, Li, Hu, Yamada, Kentaro, Ito, Tomoko, Numazawa, Satoshi, Machida, Ken, Ishikawa, Kiyoshi, Hamaguchi, Satoshi

Journal:

Japanese Journal of Applied Physics

Year:

2017

Language:

english

File:

PDF, 1.41 MB

english, 2017

27

Numerical Simulation of Atomic Layer Oxidation of Silicon by Oxygen Gas Cluster Beams

MIZOTANI, Kohei, ISOBE, Michiro, KARAHASHI, Kazuhiro, HAMAGUCHI, Satoshi

Journal:

Plasma and Fusion Research

Year:

2015

Language:

english

File:

PDF, 1.15 MB

english, 2015

28

Correlation between dry etching resistance of Ta masks and the oxidation states of the surface oxide layers

Satake, Makoto, Yamada, Masaki, Li, Hu, Karahashi, Kazuhiro, Hamaguchi, Satoshi

Journal:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Year:

2015

Language:

english

File:

PDF, 1.74 MB

english, 2015

29

Effects of hydrogen-damaged layer on tin-doped indium oxide etching by H 2 /Ar plasma

Hirata, Akiko, Fukasawa, Masanaga, Shigetoshi, Takushi, Okamoto, Masaki, Nagahata, Kazunori, Li, Hu, Karahashi, Kazuhiro, Hamaguchi, Satoshi, Tatsumi, Tetsuya

Journal:

Japanese Journal of Applied Physics

Year:

2017

Language:

english

File:

PDF, 969 KB

english, 2017

30

Damage recovery and low‐damage etching of ITO in H 2 /CO plasma: Effects of hydrogen or oxygen

Hirata, Akiko, Fukasawa, Masanaga, Kugimiya, Katsuhisa, Karahashi, Kazuhiro, Hamaguchi, Satoshi, Nagaoka, Kojiro

Journal:

Plasma Processes and Polymers

Year:

2019

Language:

english

File:

PDF, 540 KB

english, 2019

31

Molecular dynamics simulation of Si and SiO2 reactive ion etching by fluorine-rich ion species

Capdos Tinacba, Erin Joy, Isobe, Michiro, Karahashi, Kazuhiro, Hamaguchi, Satoshi

Journal:

Surface and Coatings Technology

Year:

2019

Language:

english

File:

PDF, 4.93 MB

english, 2019

32

Stability of hexafluoroacetylacetone molecules on metallic and oxidized nickel surfaces in atomic-layer-etching processes

Basher, Abdulrahman H., KrstiÄ, Marjan, Takeuchi, Takae, Isobe, Michiro, Ito, Tomoko, Kiuchi, Masato, Karahashi, Kazuhiro, Wenzel, Wolfgang, Hamaguchi, Satoshi

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2020

File:

PDF, 3.64 MB

2020

33

On-wafer monitoring and control of ion energy distribution for damage minimization in atomic layer etching processes

Hirata, Akiko, Fukasawa, Masanaga, Kugimiya, Katsuhisa, Nagaoka, Kohjiro, KARAHASHI, Kazuhiro, Hamaguchi, Satoshi, Iwamoto, Hayato

Journal:

Japanese Journal of Applied Physics

Year:

2020

File:

PDF, 607 KB

2020

34

10.3131/jvsj2.51.158

IKUSE, Kazumasa, YOSHIMURA, Satoru, TAKIZAWA, Toshifumi, KARAHASHI, Kazuhiro, KIUCHI, Masato, HAMAGUCHI, Satoshi

Journal:

Journal of the Vacuum Society of Japan

Year:

2008

File:

PDF, 410 KB

2008

35

Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO 2 ) plasma enhanced atomic layer deposition (PEALD) processes

Li, Hu, Ito, Tomoko, Karahashi, Kazuhiro, Kagaya, Munehito, Moriya, Tsuyoshi, Matsukuma, Masaaki, Hamaguchi, Satoshi

Journal:

Japanese Journal of Applied Physics

Year:

2020

File:

PDF, 1.46 MB

2020

36

Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac) 2 on a nickel oxide surface in atomic layer etching processes

Basher, Abdulrahman H., KrstiÄ, Marjan, Fink, Karin, Ito, Tomoko, Karahashi, Kazuhiro, Wenzel, Wolfgang, Hamaguchi, Satoshi

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2020

File:

PDF, 5.32 MB

2020